Thin Film Materials
| Product name |
Sputtering targets |
| Generic name |
N/A |
| Chemical formula / Diagram |
Cr, Co-Ni-Cr, Co-Nb-Zr, ZAO, ITO, Ni-Cr-Si, Cr-Si, Al, Al-Cu, Al-Si, Al-Si-Cu, C, Ta, TaSi2, W, WSi2, Ti, Ti-W, others |
| Product Overview |
Produced at both our US and Japanese facilities, Tosoh's sputtering targets are available in a variety of high purity metals, metal alloys, cermets, and ceramic compositions. Targets can be made in all shapes, sizes, and purity levels to meet design specifications |
| Applications |
Sputtering process for the production of:
1. Semiconductors
2. Magnetic recording media (rigid disks, rewritable-optical disks)
3. Recording heads
4. Thermal print heads
5. Displays
6. Thin film resistors
|
For more information, please contact your nearest representative:
TOSOH SMD, Inc. (USA)
e-mail: info@tsmd.com
URL: www.tsmd.com
Tosoh Europe B.V. (The Netherlands, TOSOH SMD Group)
e-mail: info.tse@tosoh.com
URL: www.tosoh-europe.com
TOSOH SMD Korea, Ltd.
e-mail: info@tsmd.com
TOSOH SMD Taiwan, Ltd. (Taiwan)
e-mail: kuof@tsmd.com
Tosoh Europe B.V. (United Kingdom, TOSOH SMD Group)
Tel:44-161-486-6949
Tosoh Europe B.V. (Germany, TOSOH SMD Group)
Tel: 49-9342-92280
Tosoh Asia Pte Ltd.
e-mail: info@tosoh.com.sg
Tosoh Shanghai Co., Ltd. (China)
Tel +86-21-6270-2810
|