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  Thin Film Materials


Product name Sputtering targets
Generic name N/A
Chemical formula / Diagram Cr, Co-Ni-Cr, Co-Nb-Zr, ZAO, ITO, Ni-Cr-Si, Cr-Si, Al, Al-Cu, Al-Si, Al-Si-Cu, C, Ta, TaSi2, W, WSi2, Ti, Ti-W, others
Product Overview Produced at both our US and Japanese facilities, Tosoh's sputtering targets are available in a variety of high purity metals, metal alloys, cermets, and ceramic compositions. Targets can be made in all shapes, sizes, and purity levels to meet design specifications
Applications

1. Semiconductors
2. Solar and Photovoltaic

3. Flat Panel Displays
4. Magnetic recording media (rigid disks, rewritable-optical disks)
5. Recording heads
6. Thermal print heads
7. Thin film resistors


For more information, please contact your nearest representative:

Tosoh SMD, Inc. (USA)
e-mail: info.tsmd@tosoh.com
URL: www.tosohsmd.com