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  Thin Film Materials


Product name Sputtering targets
Generic name N/A
Chemical formula / Diagram Cr, Co-Ni-Cr, Co-Nb-Zr, ZAO, ITO, Ni-Cr-Si, Cr-Si, Al, Al-Cu, Al-Si, Al-Si-Cu, C, Ta, TaSi2, W, WSi2, Ti, Ti-W, others
Product Overview Produced at both our US and Japanese facilities, Tosoh's sputtering targets are available in a variety of high purity metals, metal alloys, cermets, and ceramic compositions. Targets can be made in all shapes, sizes, and purity levels to meet design specifications
Applications Sputtering process for the production of:
1. Semiconductors
2. Magnetic recording media (rigid disks, rewritable-optical disks)
3. Recording heads
4. Thermal print heads
5. Displays
6. Thin film resistors

For more information, please contact your nearest representative:

TOSOH SMD, Inc. (USA)
e-mail: info@tsmd.com
URL: www.tsmd.com

Tosoh Europe B.V.  (The Netherlands, TOSOH SMD Group)
e-mail: info.tse@tosoh.com
URL: www.tosoh-europe.com

TOSOH SMD Korea, Ltd.
e-mail:  info@tsmd.com

TOSOH SMD Taiwan, Ltd. (Taiwan)
e-mail: kuof@tsmd.com

Tosoh Europe B.V. (United Kingdom, TOSOH SMD Group)
Tel:44-161-486-6949

Tosoh Europe B.V. (Germany, TOSOH SMD Group)
Tel: 49-9342-92280

Tosoh Asia Pte Ltd.  
e-mail: info@tosoh.com.sg

Tosoh Shanghai Co., Ltd.  (China)
Tel +86-21-6270-2810