Thin Film Deposition Materials

Contact Tosoh

To inquire about Thin Film Deposition Materials and export for your market, please contact your nearest representative:

Tosoh Corporation (Headquarters)
Shiba-koen First Bldg.
3-8-2, Shiba, Minato-ku
Tokyo 105-8623
Contact Form

Tosoh Europe B.V. (Tosoh SMD Group)
Gerbergasse 16, D-97877
Wertheim, Germany
Tel: +49 9342 9228 0
Fax: +49 9342 9228 40

Tosoh SMD, Inc (Head Office)
3600 Gantz Road
Grove City, OH

Tel: +1 614 875 7912
Fax: +1 614 875 0031

Tosoh SMD Shanghai Co., Ltd.
No. 4 Building
No. 255 Rongteng Road, Songjiang Export Processing Zone
Shanghai, China 201613
Tel: +86 21 6788 5018
Fax: +86 21 6788 5022

Product Name: Thin Film Deposition Materials
Generic Name: Sputtering Targets
Material: Cr, Co-Ni-Cr, Co-Nb-Zr, ZAO, ITO, Ni-Cr-Si, Cr-Si, Al, Al-Cu, Al-Si, Al-Si-Cu, C, Ta, TaSi2, Ti, Ti-W, others.
Product Overview:

Produced at our global facilities in the US, Japan, Korea and China, Tosoh's sputtering targets are available in a variety of high purity metals, metal alloys, cermets, and ceramic compositions. Targets can be made in all shapes, sizes, and purity levels to meet design specifications.

Visit Tosoh SMD, Inc.'s website to learn more!

Applications: Semiconductors
Solar and photovoltaics 
Flat panel displays
Magnetic recording media (rigid disks, rewritable-optical disks)
Recording heads
Thermal print heads
Thin film resistors